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Advanced Lithography with Heidelberg Instruments

Maskless Laser Lithography

Maskless Laser Lithography — Maskless lithography

Direct Writing to produce semiconductor circuits on Silicon GaAs or other substrates.

Maskless Laser Lithography — Multiple Applications

Volume Pattern Generation

MPO100 3D Microprinting — VPG 300

Large Volume Pattern Generation

Heidelberg-applications-Two-Photon-Polymerization-MPO — Multiple applications

Small Benchtop Capability

uMLA

Direct Wrinting flexible from mask making to microfluidics - Flexibility is key!

Nanofrazor — Multiple Applications