Spin Rinse Dryer
What is a Spin Rinse Dryer?
Semiconductor wafers are fabricated in a clean environment. As electronic devices and chips get smaller and smaller particles become critical to ensure wafers yield good working chips. The semiconductor processing is a sequence of steps when chemicals are used either to add layers or remove layers, either fully or partially, and particles can be generated in these processes as well as from the external environment.
Before a semiconductor wafer starts the next processing step, it is essential that the wafers are as clean as possible and are perfectly dry before progressing through the line - this is the job of the spin rinse dryer.
Maintenance and Operator training available !
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Cleanliness is Essential
Every part of the spin rinse dryer is designed to clean and keep wafers clean - washing away any loosely adhered particles. Some design criteria:
- Contactless Nitrogen Seal
- Rinse to Resistivity Option
- Anti-Static Options
- Mirror Polished Stainless Steel
- Multi-Step Processing
- Anti-Vibration Balancing
- Customised Rotors and Holders
Flexibility
Whatever your wafer/mask/substrate size there is a spin rinse dryer to suit. If you need multiple substrate sizes to be run additional rotors or specially machine inserts provide that flexibility.
TS Model for all your data needs
The MTek TS model is PLC controlled via touch screen operation. the PLC provides data logging, essential in todays manufacturing environment.
Upgrades and Repair
From newly designed and built systems to upgrading tools either in the field or back at the factory we can provide a cost effective solution