What is a Spin Rinse Dryer?
Semiconductor wafers are fabricated in a clean environment. As electronic devices and chips get smaller and smaller particles become critical to ensure wafers yield good working chips. The semiconductor processing is a sequence of steps when chemicals are used either to add layers or remove layers, either fully or partially, and particles can be generated in these processes as well as from the external environment.
Before a semiconductor wafer starts the next processing step, it is essential that the wafers are as clean as possible and are perfectly dry before progressing through the line - this is the job of the spin rinse dryer.
Cleanliness is Essential
Every part of the spin rinse dryer is designed to clean and keep wafers clean - washing away any loosely adhered particles. Some design criteria:
- Contactless Nitrogen Seal
- Rinse to Resistivity Option
- Anti-Static Options
- Mirror Polished Stainless Steel
- Multi-Step Processing
- Anti-Vibration Balancing
- Cutomised Rotors and Holders
Many SRD's are required after the end of a wet processing step. Check out our wet bench pages.
Related Products and Services
There are several ways to clean and dry wafers. We provide both Spin Rinse Drying or Vapor drying.
We are local agents for the world leader in high putity fluid handling solutions. With a range across the board for corrosive or elevated temperatures the White Knight products are renowned for quality, reliability, and increased uptime.
Upgrades and Repair
From newly designed and built systems to upgrading tools either in the field or back at the factory we can provide a cost effective solution